One of the major technical challenges is the efficient production of high quality slitmasks in order to maximize the use of SWIFT's highly multiplexed spectroscopic capability. Since it takes many hours to drill, punch, or burn (with a laser) many thousands of slitlets or holes in a mask, alternatives must be considered. Among these are ``microshutters'', LCD panels, and chemical etching. A fallback is to utilize a bank of several mask cutters of a more classical design in order to multiplex the mask generation. Furthermore, slitmasks must be astrometrically accurate over a half-meter curved focal surface. One possible solution is to coat a glass plate with a black substance and then ``burn'' off that substance with a laser in the slitlet locations. In addition, since a large field of view causes atmospheric refractive effects that alter the apparent astrometry, a mask can be used for only a limited time on the sky unless the atmospheric distortion is optically corrected in the telescope. We are looking into ways to minimize this effect.